NoneQuartz [SiO2]

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Spectrum Line Material Emitter Position Measurement Technique Temperature Reference
— — Quartz Intrinsic defect 175.0nm … CL/SEM Ambient Richter et al. 2003
— — Quartz, igneous Oxygen vacancy? 280.0nm (40.0 nm FWHM) — — — Rink et al. 1993
— — Quartz Intrinsic defect 290.0nm … CL/SEM Ambient Richter et al. 2003
— — Quartz, igneous Unspecified 330.0nm — — — Rink et al. 1993
— — Quartz Intrinsic defect 340.0nm … CL/SEM Ambient Richter et al. 2003
— — Quartz, granitic (H4O4)0 360.0 - 380.0nm — — — Rink et al. 1993
— — Quartz (H3O4)0 hole traps 380.0nm — — — Rink et al. 1993
— — Quartz Defect 380.0nm (120.0 nm FWHM) … CL/SEM Ambient Luff & Townsend 1990
— — Quartz [AlO4|M+]- center 380.0 - 390.0nm … CL/SEM Ambient Richter et al. 2003
— — Quartz, hydrothermal Unspecified 390.0nm … CL Ambient Preusser et al. 2009
— — Quartz Unspecified 400.0nm — — — Gritsenko & Lisitsyn 1985
— — Quartz Oxygen orbitals? 400.0nm (100.0 nm FWHM) … CL/SEM Ambient Grant & White 1978
— — Quartz Intrinsic defect 420.0nm … CL/SEM Ambient Richter et al. 2003
— — Quartz, granitic Unspecified 420.0 - 435.0nm — — — Rink et al. 1993
— — Quartz Defect 440.0nm (120.0 nm FWHM) … CL/SEM Ambient Luff & Townsend 1990